Is DisChem HSQ Ready for High-Resolution EBL?
Yes, DisChem HSQ is designed for demanding electron beam lithography where fine pattern definition, sensitivity, and etch resistance matter. DisChem’s H-SiQ is a negative-tone hydrogen silsesquioxane resist derived from dry silica resin and supplied in semiconductor-grade MIBK carrier solvent for EBL. For engineers working on direct-write thin-film applications, the important question is not simply whether an HSQ material can create small features.
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